Thin Solid Films, Vol.515, No.14, 5593-5596, 2007
In situ X-ray studies of metal organic chemical vapor deposition of PbZ(x)Ti(1-x)O(3)
In situ synchrotron X-ray scattering and fluorescence techniques were used to simultaneously observe the evolution of the strain and composition of a growing crystal surface in real time. Control of the X-ray incidence angle allows us to obtain high surface sensitivity. We studied metal organic chemical vapor deposition (MOCVD) of epitaxial PbZrxTi1-xO3 (PZT) onto SrTiO3 (001) substrates under various growth conditions. We observe a strong increase in Zr incorporation as strain relaxation occurs, consistent with the effect of compositional strain on the thermodynamic driving force for growth. (c) 2006 Elsevier B.V. All rights reserved.
Keywords:organometallic vapour deposition;X-ray scattering;depth profiling;surface composition;alloy oxides