Chemistry Letters, Vol.35, No.10, 1098-1099, 2006
Stabilization of polystyrene thin films against dewetting by silsesquioxane-terminated polystyrene additives
A polyhedral oligomeric silsesquioxane (POSS)-containing initiator for nitroxide-mediated radical polymerization was synthesized to prepare organic-inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with a POSS end group. PS-POSS were well dispersed in PS thin films and provided thermal stability to films against dewetting.