Nanogap electrodes were prepared by electroplating. The starting electrodes of gold were patterned by conventional photolithography and lift-off techniques, and the gap separation was reduced by depositing gold in electroplating solution. Careful control of deposition conditions by monitoring the current through the electrodes enabled us to obtain the electrodes with the separation of less than 10nm. Electrical conductunce of newly designed oligothiophene wires was measuerd with the nanogap electrodes prepared.