화학공학소재연구정보센터
Journal of Crystal Growth, Vol.211, No.1-4, 339-342, 2000
Growth and characterization of high-purity SiC single crystals
High-purity SiC single crystals with diameter up to 50 mm have been grown by the physical vapor transport method. Finite element analysis was used for thermal modeling of the crystal growth cavity in order to reduce stress in the grown crystal. Crystals are grown in high-purity growth ambient using purified graphite furniture and high-purity SiC sublimation sources. Undoped crystals up to 50 mm in diameter with micropipe density less than 100 cm(-2) have been grown using this method. These undoped crystals exhibit resistivities in the 10(3) Omega cm range and are p-type due to the the presence of residual acceptor impurities, mainly boron. Semi-insulating SiC material is obtained by doping the crystal with vanadium. Vanadium has a deep donor level located near the middle of the band gap, which compensates the residual acceptor resulting in semi-insulating behavior.