화학공학소재연구정보센터
Journal of Crystal Growth, Vol.213, No.3-4, 235-240, 2000
Formation and characteristics of inversion domain in GaN grown by hydride vapor-phase epitaxy
Heteroepitaxial GaN film was grown on sapphire (0 0 0 1) substrate by hydride vapor-phase epitaxy and it was observed employing scanning electron microscopy and cathodoluminescence that there were microstructural inhomogeneous areas showing suppressed luminescence characteristics compared with the surrounding matrix. They were presumed to be induced by polarity-inverted domains identified on the basis of the chemical inertness and heavily doped characteristics manifested in cathodoluminescence spectra.