Effects of sapphire substrate offset angle on MBE growth of ZnO films were investigated. Twin crystal RHEED patterns and surface facetting observed with c-plane just-oriented substrates were suppressed by enlarging the offset angles from near-zero to 2.87 degrees. Improvement in FWHM of XRC and surface morphology was observed with larger offset angles. indicating that the offset angle also is a sensitive factor for ZnO film growth.