화학공학소재연구정보센터
Journal of Crystal Growth, Vol.221, 431-434, 2000
Hetero-epitaxial growth of ZnO thin films by atmospheric pressure CVD method
High-quality ZnO films were successfully prepared by atmospheric pressure CVD using zinc acetylacetonate (Zn(C5H7O2)(2)) and oxygen as sources. Epitaxial growth was achieved on (0112)-oriented single-crystal sapphire substrates, The crystal quality of ZnO films was highly dependent on the film thickness, and crystallinity was improved remarkably at thicknesses over 0.32 mum. The cathodoluminescence spectra of the films had a strong peak of band-edge emission at 379 nm and the so-called green emission at visible region was very weak.