Journal of Crystal Growth, Vol.226, No.4, 451-457, 2001
Dopant distribution in selectively regrown InP : Fe studied by time-resolved photoluminescence
We apply time-resolved photoluminescence with 1 mum spatial resolution for the characterization of iron distribution in semi-insulating InP:Fe epitaxial layers regrown by hydride vapor-phase epitaxy around etched mesas. The InP:Fe regrowth was carried out on InP:S mesas etched both along the [110] and [110] crystallographic directions, as well as on InP/InGaAsP in-plane lasers. In all cases, the Fe concentration was found to be close to the target values and showed little variation along the regrown layers.
Keywords:time-resolved photoluminescence;computer simulation;hydride vapor phase epitaxy selective regrowth;semi-insulating InP : Fe;laser diode