Journal of Crystal Growth, Vol.248, 343-347, 2003
InGaAsN/GaAs QD and QW structures grown by MOVPE
InGaAsN/GaAs heterostructures were grown by low pressure MOVPE. Their structural and optical properties were investigated. Pseudomorphic InGaAsN/GaAs layers with a band gap as low as 0.9 eV as well as ternary InAsN quantum dot and well structures were fabricated. It was shown that the addition of a few percent of nitrogen during the formation of the InAs quantum dots led to a decrease in their dimensions and density which was also accompanied by a sharpening of their uniformity distribution. An increase of the nitrogen content reduced the lattice mismatch between InAsN and GaAs. This also gave rise to a layer-by-layer growth mode and smooth heterointerfaces. The InAsN/GaAs multiple quantum well heterostructures so fabricated had improved structural quality and demonstrated intense photoluminescence at room temperature. (C) 2002 Published by Elsevier Science B.V.
Keywords:nitrogen incorporation;photoluminescence;metalorganic vapor phase epitaxy;quantum dots;quantum wells;GaInAsN