We applied a facing-target sputtering technique to grow thin platinum (Pt) films on single-crystal substrates SrTiO3(1 0 0), NdGaO3(1 1 0) and MgAl2O4(1 0 0). The films prepared at low substrate temperatures (T-S = 300-500degreesC) have mixed orientations, (1 1 1)/(1 0 0) on SrTiO3 and MgAl2O4, and (1 1 1)/(1 1 0) on NdGaO3. At T-S = 700degreesC, Pt film is grown epitaxially with (1 0 0) orientation on SrTiO3(1 0 0) and MgAl2O4(1 0 0), and (1 1 0) orientation on NdGaO3(1 1 0). We also grew epitaxial Pt(50 nm)/La2/3Ca1/3MnO3(50 nm)/SrTiO3(1 0 0) structure, indicating that Pt is a good electrode for devices involving colossal magnetoresistance materials. (C) 2003 Elsevier Science B.V. All rights reserved.