Journal of Crystal Growth, Vol.258, No.1-2, 26-33, 2003
Overgrowth on InP corrugations for 1.55 mu m DFB LDs by reduction of carrier gas flow in LPMOCVD
We describe reproducible and uniform overgrowth on InP corrugations to fabricate DFB LDs by reduction of carrier gas in an LPMOCVD system. The reduction of carrier gas from 201/min, which was a typical growth and system-recommended condition, to 21/min during heat-up time enabled the growth of an InGaAsP layer on InP corrugations for any heat-up condition including heat-up time and heat-up ambient. The TEM image showed abrupt interfaces in the MQW layer and a non-defective interface between the InGaAsP layer and the InP corrugations. This study demonstrated the variation of residual grating depth with changing the heat-up time while maintaining a specific gas ambient. The SEM and microscopic images showed the effect of reducing the carrier gas flow. A fabricated DFB laser diode with 1.55 mum operating wavelength showed a threshold current of 12mA (36 mA) and slope efficiency of 0.32mW/mA (0.22 mW/mA) at 25degreesC (100degreesC). Aside mode suppression ratio (SMSR) of 50 dB was obtained within the range of temperature, 25-85degreesC, and an injection current range of 40-200 mA. (C) 2003 Elsevier B.V. All rights reserved.