Journal of Crystal Growth, Vol.264, No.1-3, 53-57, 2004
Effects of TMIn flow on the interface and optical properties of InGaN/GaN mutiple quantum wells
The effects of pre-TMIn flow prior to QW growth and TMIn flow rates during QW growth on the interface and optical properties of InGaN/GaN MQWs were investigated. Pre-depositing indium prior to QW growth and an appropriate TMIn flow rate can improve the interface abruptness and increase the EL intensity. InGaN/GaN MQWs with improved interface abruptness have increasing emission intensity and wavelength. We attribute the interface improvement and the increase of EL intensity to the improvement of the indium compositional profiles. (C) 2004 Elsevier B.V. All rights reserved.
Keywords:high-resolution X-ray diffraction;metalorganic vapor phase epitaxy;multiple quantum wells;nitrides