Journal of Crystal Growth, Vol.265, No.1-2, 296-301, 2004
Epitaxial growth and domain coalescence of sexithiophene induced by the steps on cleaved KBr(001)
Epitaxial growth of sexithiophene (6 T) thin films was achieved on KBr (001) under the optimum condition. Atomic force microscopy revealed that the initially formed in-plane orientation was caused by adsorption of 6 T molecules to the native steps on K Br and it helped formation of single-crystalline domains larger than 30 x 30 mum(2). The use of substrate steps as an epitaxial template shows the possibility to create high quality 6 T films with potentially large carrier mobility. (C) 2004 Elsevier B.V. All rights reserved.
Keywords:atomic force microscopy;X-ray diffraction;molecular beam epitaxy;KBr;sexithiophene;organic semiconductor