화학공학소재연구정보센터
Journal of Crystal Growth, Vol.268, No.3-4, 396-400, 2004
Study of InGaAsP and GaInP layers grown by MOCVD in pure N-2 ambient for InGaAsP/GaAs single QW LD structures
InGaAsP and GaInP layers has been grown by MOCVD technique using tertiarybutylarsine and tertiarybutylphosphine in pure nitrogen ambient for fabrication of InGaAsP/GaAs single QW laser diode structures. The composition control and the temperature dependence of the optical quality of In1-xGaxAsyP1-y layers and the Si- and Zn-doping behaviors in GaInP layers are emphatically discussed. (C) 2004 Elsevier B.V. All rights reserved.