Journal of Crystal Growth, Vol.281, No.2-4, 242-248, 2005
Single crystal growth of GaN using a Ga melt in Na vapor
GaN single crystals were grown by heating a Ga melt in Na vapor at 720-800 degrees C and 5 MPa of N-2 for 200 h. The Ga melt absorbed Na from the vapor and formed a Na-Ga melt. Transparent prismatic GaN single crystals grew from the wall of a boron nitride crucible in the melt. Seventy five percent of Ga reacted with nitrogen and changed into GaN crystals at 720 degrees C when the initial amount of a Ga melt was 0.15g. With a Ga melt of 0.75g, 11% and 57% of Ga changed into GaN single crystals at 720 degrees C and at 800 degrees C, respectively. The rest of the Ga crystallized as a Na-Ga intermetallic compound after cooling. The size of the prismatic GaN single crystals obtained at 800 degrees C was 1.0-2.5 mm long and 0.3-1.0mm wide. (c) 2005 Elsevier B.V. All rights reserved.
Keywords:growth from solutions;single crystal growth;gallium compounds;nitrides;semiconducting III-V materials