Journal of Crystal Growth, Vol.298, 468-471, 2007
MgxZn1-xO films grown by remote-plasma-enhanced MOCVD with EtCp2Mg
Mg,Zn1-xO films were successfully grown by remote-plasma-enhanced metalorganic chemical vapor deposition (RPE-MOCVD) with bis-ethylcyclopentadienyl magnesium (EtCp2Mg). Mg content x in MgxZn1-xO films was controlled by varying the growth temperature and the radio-frequency (RF) power. The Mg content x in wurtzite-MgxZn1-xO films slightly increased around 0.07 with increasing the growth temperature from 400 to 600 degrees C. At 700 degrees C, MgxZn1-xO films had wurtzite and rock-salt structure, and Mg content increased to 0.42. Mg content x in wurtzite-MgxZn1-xO films decreased from 0.25 to 0.09 with increasing RF power from 20 to 70W. And MgxZn1-xO films grown between 0 and 10W had amorphous structure. (c) 2006 Elsevier B.V. All rights reserved.