Journal of Crystal Growth, Vol.303, No.1, 357-361, 2007
Application of flow-kinetics model to the PVT growth of SiC crystals
A 2-D flow-kinetics model for the PVT growth has been used to describe the phenomena of multi-phase flow, mass transfer and kinetics in the growth process of SiC crystals. The model couples the 2-D gas flow calculations and the growth kinetics at the crystal interface. We calculated the axisymmetric flow field and species concentration field as well as growth rate profile by a finite volume-based code. Species transfer in the cavity is dominated by the diffusion at growth pressures of 8-14 kPa. Supersaturation at the crystal interface is less than 1 Pa at growth pressures of 8-14 kPa. (c) 2006 Elsevier B.V. All rights reserved.
Keywords:fluid flows;growth models;growth from vapor;single-crystal growth;semiconducting silicon compounds