Applied Surface Science, Vol.154, 35-39, 2000
Ablation study on pulsed KrF laser annealed electroluminescent ZnS : Mn/Y2O3 multilayers deposited on Si
The ZnS:Mn active layer of a thin film electroluminescent (TFEL) device has been annealed under 1.034 MPa (10.34 bar, 150 psi) of argon pressure using a 20-ns pulsed KrF excimer laser. We investigate the effects of multiple shots at various power densities upon the ablation rates of the ZnS:Mn layer. The results are compared to a thermal simulation of the laser-matter interaction using single pulse irradiation, and it is inferred that the cubic to hexagonal transition and melting of ZnS:Mn decrease the ablation rate.