Hydrogenated carbon nitride thin films were deposited on silicon substrates by laser-induced chemical vapor deposition (L-CVD) using an ArF excimer laser (lambda = 193 nm) and different C2H2/NH3 gas mixtures. The surface and bulk compositions were obtained from X-ray photoelectron spectroscopy (XPS) and elastic recoil detection analysis (ERDA), respectively. FTIR spectroscopy showed that the films contain mainly C=C and sp(2)/sp(3)C-N bonds. Vibrational properties were also investigated by Raman spectroscopy in order to monitor the effect of the nitrogen incorporated in the deposited films. The relationships between the composition and chemical bond types were discussed and referred to the deposition parameters.