Titanium dioxide thin films were deposited from titanium tetraisopropoxide in an oxygen atmosphere by light induced chemical vapor deposition (LICVD), using a 308 nm XeCl excimer laser We report on the influence of substrate holder temperature at a low fluence (150 mJ/cm(2)) on the deposition on glass substrates. The growth rate follows an Arrhenius behavior between 120 and 210 degreesC, corresponding to an activation energy of the deposition reaction of 20 kJ/mol. XRD and Raman spectroscopy detected a mixture of anatase and rutile crystals, possibly in an amorphous material. With increasing substrate temperature, the crystallinity is enhanced and the ratio, anatase/rutile increases.