TiO2 thin films were deposited on Si(1 0 0) substrates by pulsed laser deposition technique using Nd:YAG laser. A high deposition rate of 4.6 nm/min at a laser fluence of 6.5 J/cm(2) and a pulse repetition frequency of 30 Hz was obtained. The X-ray diffraction patterns of the films were studied as a function of the film thickness. The results show that the 700 nm-thick films consisted of anatase and rutile structure. As film thickness increased, the amount of anatase phase crystal increased, whereas the rutile remained constant.