Applied Surface Science, Vol.169, 757-762, 2001
Studies on reactive sputtering process of TiN films using small mass analyzers
Investigation on the reactive sputtering plasma process for the TiN films has been carried out, using small mass analyzers located in a discharge vessel without differential pumping units. A reaction mechanism is studied on time-dependent data of the transition of a Ti-target surface from nitride to the metallic state. The flux of ionic species from the plasma has been measured as well, and is discussed in association with the electric potential formation.