Applied Surface Science, Vol.173, No.1-2, 40-43, 2001
An expanding thermal plasma for deposition of surface textured ZnO : Al with focus on thin film solar cell applications
A new method for low temperature deposition of surface textured ZnO:Al is presented utilizing an expanding thermal plasma created by a cascaded are. Films are deposited at 200 degreesC at the rate of 0.65-0.75 nm s(-1) exhibiting low resistivity (<10(-3) cm), high visible transmittance (>80%) and a rough surface texture. First application in p-i-n a-Si:H solar cells indicates promising light trapping properties.
Keywords:zinc oxide;expanding thermal plasma;surface texture;transparent conducting oxide;solar cells