In this study, the fabrication of two-dimensional photonic structures by means of interference lithography is discussed. The proposed method provides flexible formation of various configuration two-dimensional interference patterns depending on the number of beams and their interorientation, Mainly, triangular and square lattice configurations are modeled. It is shown that C the dimensions of substructure increase with the number of beams superpositioning. Mask fabrication by SF6/N-2 reactive ion etching, while transferring the pattern onto silicon substrate is presented. (C) 2002 Elsevier Science B.V. All rights reserved.