A dynamic model for nanosecond dry laser cleaning (DLC) is discussed. Formulas for the time-dependent thermal expansion of the substrate, valid for temperature-dependent parameters are given. Van der Waals adhesion, the elasticity of the substrate and particle, as well as particle inertia are taken into account for an arbitrary temporal profile of the laser pulse. Time scale related to the size of the particles and to the adhesion/elastic constants is revealed. Cleaning proceeds in different regimes if the duration of the laser pulse and its edges are much shorter/longer than this characteristic time. Utilization of resonance effects and steep fronts of cleaning pulse are suggested. Simple expressions for cleaning thresholds are discussed. Numerical results are presented for the cleaning of Si surfaces from spherical SiO2 particles. (C) 2002 Elsevier Science B.V. All rights reserved.