SIMS depth profiles for full wafer analyses were carried out on the CAMECA IMS Wf instrument. Experiments have been performed in order to investigate the analytical performance of this SIMS instrument for shallow, medium and deep profiles in terms of measurement repeatability and sample throughput. First results using a cassette loader option implemented on the IMS Wf are presented. (C) 2004 Elsevier B.V. All rights reserved.