화학공학소재연구정보센터
Applied Surface Science, Vol.252, No.19, 7290-7292, 2006
Secondary ion measurements for oxygen cluster ion SIMS
We have proposed to use oxygen cluster ions, which are much larger than molecular ions, as primary ions for secondary ion mass spectrometry (SIMS). A high intensity gas cluster ion source with a current density of a few mu As/cm(2) has been developed. Secondary ions emitted from Si have been investigated under O-2 and Ar cluster ion bombardment. A large enhancement of the yield of secondary ions produced by large O-2 and Ar cluster ions was found. The SIMS system utilizing large O-2 cluster ions must give both excellent depth resolution and high secondary ion yield. (c) 2006 Elsevier B.V. All rights reserved.