A simple process to achieve patterned silica films is described. The patterning of the catalyst poly-L-lysine via photolithography and liftoff enables the spatial and geometrical control of silicification. Microscopy and chemical characterization demonstrate that this process enables consistent patterning of silica with 10 lint resolution in a variety of geometries. In addition, the spatial and geometrical control of the silica is demonstrated under different reaction conditions and yields various silica morphologies. The ability to simultaneously pattern bio-inspired silica and control its morphology may allow the tailoring of silica and other silicon-based materials for future applications. (c) 2005 Elsevier B.V. All rights reserved.