Structures with periods as small as 140 nm can be created employing evanescently decaying components combined with ultrathin resists in optical lithography. The technique, called ENFOL (evanescent near-field optical lithography) (see Figure), its applications, and simulations of the process are unraveled in this review. ENFOL promises the high-throughput. low-cost, nanometer-scale patterning of large areas.