Advanced Materials, Vol.13, No.15, 1174-1174, 2001
Formation of a cobalt magnetic dot array via block copolymer lithography
Single-domain cobalt dot arrays with high magnetic particle density, patterned over large areas (e.g., 10 cm diameter wafers) are fabricated by self-assembled block copolymer lithography, using a polystyrene-poly(ferrocenyldimethylsilane) copolymer as a template. By varying the copolymer type and etching conditions the magnetic properties can be tuned. The Figure shows a typical array of Co dots with tungsten caps obtained via this procedure.