Advanced Materials, Vol.14, No.13-14, 991-991, 2002
Growth of GaN nanorods by a hydride vapor phase epitaxy method
Straight and well-aligned GaN nanorods have been obtained by horizontal hydride vapor phase epitaxy (HVPE) at a relatively low temperature (similar to480degreesC). This catalyst- and template- independent method involves the controllable growth of GaN nanorods on a sapphire substrate, with the rods preferentially oriented along the crystal c-axis. The Figure shows a cross-sectional SEM image of the GaN nanorods.