Soft-lithographic patterning of thin-film material microstructures supported on spherically curved lenses (see Figure) using an extension of decal transfer lithography (DTL) is reported. These processes have been used to successfully create a pattern of amorphous silicon and gold thin-film microstructures with feature sizes ranging from 2 mum to 75 mum. This has been achieved without noticeable defects using wet and reactive-ion etching processes across large substrate areas.