화학공학소재연구정보센터
Advanced Materials, Vol.17, No.14, 1757-1757, 2005
Sub-10 nm high-aspect-ratio patterning of ZnO using an electron beam
An electron-beam-sensitive zinc naphthenate resist is used to pattern ZnO. Features as small as 7 nm and with an aspect ratio of similar to 9 can be patterned. Size reduction to similar to 5 nm is observed when these patterns are heat treated to give crystalline ZnO (see Figure). The functionality of ZnO is confirmed via photoluminescence studies.