화학공학소재연구정보센터
Advanced Materials, Vol.18, No.11, 1377-1377, 2006
Kinetics and mechanism of atomic force microscope local oxidation on hydrogen-passivated silicon in inert organic solvents
Conductive atomic force microscope (AFM) nanopatterning on hydrogen-terminated silicon in a hydrophobic organic solvent under ambient conditions produces features consistent with AFM field-induced oxidation. The growth rate of the oxide features (see figure) exhibits modulation consistent with a space-charge-limited growth mechanism.