Macromolecular Rapid Communications, Vol.23, No.2, 104-108, 2002
Photosensitive polyarylates based on reaction development patterning
Communication: Films of a commercially available polyarylate (U polymer(R)) containing a photosensitive agent were prepared by means of spin-coating onto copper foil, which showed positive-tone behavior after UV irradiation and development with an ethanolamine/N-methylpyrrolidone/H2O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (approximate to10 mum fine/space resolution) with 9-14 mum film thickness. The pattern-forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern-forming reaction occurs during development.
Keywords:diazonaphthoquinone;photoresists;polyarylates;polyesters;reaction development patterning (RDP)