The aluminium deposition processes on tungsten electrodes were investigated in temperature molten salt (aluminium chloride + trimethylphenylammonium chloride), using voltammetry and chronoamperometry. In melts with 2:1 mole ratio, the reduction of Al2Cl7- ions was quasi-reversible and involved a nucleation and growth mechanism. Underpotential deposition of aluminium, corresponding to several monolayers, was also observed. Chronoamperometric analysis showed that the deposition of aluminium was instantaneous three-dimensional nucleation with hemispherical diffusion-controlled growth.