A silicon-based microelectrode array for a wide variety of applications has been developed, This microelectrode array represents a well-suited alternative to current methods of chemical analysis and is useful in order to study and optimize effects such as material corrosion, etching processes and different passivation layers. Microelectrodes with a high aspect ratio for space-resolved measurements and an integrated energy supply could be realized by galvanic deposition. The used passivation layers were characterized by scanning electron microscopy (SEM), optical microscopy and small area X-ray photoelectron spectroscopy (XPS). The electrodes have been investigated by SEM, cyclic voltammetry and laser profilometry.