Texturing of as-cut (110) and (111) p-type silicon was obtained by applying very negative potentials (down to -50 V) in aqueous solution containing alkaline salt (KOH) in the dark. This process results in highly textured silicon surface with a strong dependence on sample crystalline. Experimental data obtained via negative potential dissolution process of as-cut p-type silicon negatively polarized to a potential of 245 V and related model, indicate that process time has a major influence on the developed textured surface. (C) 2004 The Electrochemical Society.