Previous Article Next Article Table of Contents Electrochemical and Solid State Letters, Vol.9, No.5, L4-L4, 2006 DOI10.1149/1.2179770 Export Citation Iridium barriers for direct copper electrodeposition in damascene processing (vol 9, pg C48, 2006) Josell D, Bonevich JE, Moffat TP, Aaltonen T, Ritala M, Leskela M Please enable JavaScript to view the comments powered by Disqus.
