Transparent ZnO layers were prepared on silica glass substrates by the spin coating-pyrolysis process. As-deposited films were prefired at 250 degrees C for 60 min, at 350 degrees C for 30 min, and at 500 degrees C for 10 min, followed by heat treatment at 900 degrees C for 30 min in air. The ZnO films were analyzed by high resolution X-ray diffraction, field emission-scanning electron microscopy, scanning probe microscopy, and ultraviolet-visible-near infrared spectrophotometry. (002)-oriented ZnO films were obtained by pre-firing at 350 degrees C and at 500 degrees C. All the ZnO films exhibited a high transmittance, above 80%, in the visible region, and showed a sharp fundamental absorption edge at 0.38-0.40 mu m. The most highly c-axis-oriented ZnO with a homogeneous surface was observed at a pyrolysis temperature of 350 degrees C. (c) 2006 Elsevier B.V. All rights reserved.