Solid-State Electronics, Vol.44, No.12, 2117-2122, 2000
Processing techniques for InGaAs/InAlAs/InGaAs spin field effect transistors
Wet etch processing techniques For InGaAs/Inal/As/InGaAs transistors are used to Fabricate an N-channel HEMT (High Electron Mobility Transistor) with Fe contacts. These processing techniques can easily be extended for dilute magnetic semiconductor regrowth and for testing of various spin injection geometries.