Solid-State Electronics, Vol.51, No.5, 655-661, 2007
Compact model for highly-doped double-gate SOI MOSFETs targeting baseband analog applications
An analytical and continuous model for a highly-doped double-gate Sol MOSFET, in which the channel current is expressed as an explicit function of the applied voltages, is presented targeting the electrical simulation of baseband analog circuits. A unified charge control model is for the first time derived for doped double-gate transistors. It is valid from below to well above threshold, showing a smooth transition between the regimes. Small-signal parameters can be obtained from the model. The calculated current and capacitance characteristics show a good agreement with 2D numerical device simulations, in all regimes, and also a very good match to FinFET experimental data, in the case of the drain current. (c) 2007 Elsevier Ltd. All rights reserved.