Indium tin oxide thin films were deposited by computer assisted advanced PLD method in order to obtain transparent, conductive and homogeneous films on a large area. The films were deposited on glass substrates. We studied the influence of the temperature (room temperature (RT)-180 degrees C, pressure (1-6 x 10(-2) Tort), laser fluence (1-4 j/cm(2)) and wavelength (266-355 nm) on the film properties. The deposition rate, roughness, film structure, optical transmission, electrical conductivity measurements were done. We deposited uniform ITO thin films (thickness 100-600 nm, roughness 5-10 nm) between RTand 180 degrees C on a large area(5 x 5 cm(2)). The films have electrical resistivity of 8 X 10(-4) Omega cm at RT, 5 x 10(-4) Omega cm at 180 degrees C and an optical transmission in the visible range, around 89%. (c) 2007 Elsevier B.V. All rights reserved.