화학공학소재연구정보센터
Applied Surface Science, Vol.253, No.19, 7890-7894, 2007
Micro-structuring of TiO2 thin films by laser-assisted diffraction processing
Thin films of TiO2 are deposited by magnetron sputtering on glass substrate and are irradiated by UV radiation using a KrF excimer laser (248 nm). These thin films are patterned with a razor blade placed on the way of the radiation just in front of the TiO2 thin film. Just near the edge of the razor blade on the thin film, diffraction lines are observed, resulting in the ablation of the film. These patterns are characterized by optical microscopy, mechanical profilometry. Diffraction up to the 35th order is observed. The results are shown to be compatible with a model in which electronic excitation plays the major role. (c) 2007 Elsevier B.V. All rights reserved.