화학공학소재연구정보센터
Applied Surface Science, Vol.253, No.21, 8689-8694, 2007
Effect of swift (similar to 100 MeV) heavy ion irradiation on surface morphology and electronic transport in Fe film on Si substrate
Fe film (similar to 50 mn) have been deposited on psi substrate by electron beam evaporation technique. The bilayers have been irradiated by 100 MeV Fe7+ ions having fluences of 1 X 10(13), 1 X 10(14) and 5 x 10(14) ions cm(-2). SEM study of the unirradiated devices show surface modifications having a annular structures. From XRD study of the bilayer, it is observed that grain size has reduced from 70 to 25 nm after the irradiation for a fluences of 1 X 10(14) ions cm(-2). Moreover electronic transport data of the bilayer show practically no effect on the current flow for a fluence of 1 X 10(13) ions cm(-2) irradiation whereas for 1 x 10(14) ions cm(-2) fluence, there is very significant change in current flow (by two orders in magnitude) across the bilayer. However, for a higher fluence of irradiation 5 x 1014 ions cm(-2), the bilayer becomes highly resistive. It has been found from the above observations that the fluence of 1 X 10(14) ions cm(-2) of swift heavy ion irradiation is a optimum fluence. (c) 2007 Elsevier B.V. All fights reserved.