The authors demonstrate a simple approach for the construction of single photon sources utilizing focused ion beam (FIB) etching, a maskless fabrication technique. Here they use FIB with gas-assisted etching to fabricate micropillar microcavities from a GaAs/AlGaAs distributed Bragg reflector planar cavity containing self-assembled InAs quantum dots. Using a 1.5 mu m square pillar, they demonstrate a single photon source where the two photon emission is suppressed by a factor of 3.8. They believe this to be the first example of a FIB fabricated pillar single photon source. (c) 2007 American Vacuum Society.