폴리비닐알콜에 감광성기를 도입한 수용성 감광성 고분자의 합성 및 감광특성

박이순; 한윤수

Polymer(Korea), Vol.19, No.5, 715-721, September, 1995

Export Citation

폴리비닐알콜에 감광성기를 도입한 수용성 감광성 고분자의 합성 및 감광특성

Synthesis and Photochemical Properties of Water Soluble Photosensitive Polymer Based on Poly( vinyl alcohol)

박이순, 한윤수

초록

광 이량화 특성을 나타내는 1-methyl-4-[2-(4-formylpheny1)ethenyl] pridinium methosulfate (SbQ염)와 1-methyl-4-[2-(4-diethylacetylphenyl)ethenyl] pridinium methosulfate(SbQ-A염)를 dimethyl sulfate, terephthalaldehyde mono-(diethyl acetal) 및 4-picoline을 이용하여 합성하였다. 합성된 SbQ 및 SbQ-A염은 FT-IR, ¹H-NMR, 자외 흡광 분광기를 이용하여 구조확인을 하였으며 자체의 감광특성을 조사하였다. 수용액에서 산촉매를 사응하여 SbQ 혹은 SbQ-A염을 PVA 측쇄에 도입하여 PVA-SbQ를 합성하였으며 광가교 특성을 조사하였다. PVA-SbQ의 합성에 있어서 반응물로 사용된 SbQ-A염의 함량과 PVA내 도입량 사이의 관계는 도입량 증가에 따른 반응계의 점도증가에 의해 2.09 mol% 이상부터는 비선형성을 나타내었다. 또 자외선 흡수 분광법으로써 합성된 PVA-SbQ내의 SbQ 도입량을 정량하였다.

Photosensitive compounds, 1-methy1-4-[2-(4-formylpheny1) ethenyl] pridinium methosulfate (SbQ salt) and 1-methyl-4-[2-(4-diethylacetylpheny1) etheny1] pridinium methosulfate (SbQ-A salt), were synthesized from dimethy1 sulfate, terephthalaldehyde mono-(diethyl acetal) and 4-picoline. The structure of SbQ and SbQ-A salt were confirmed by FT-IR, ¹H-NMR and GC-mass spectrometer. SbQ or SbQ-A salts were reacted with poly (vinyl alcohol), (PVA) in aqueous solution with acid catalyst to give photosensitive PVA-SbQ. The photocrosslinking reaction of PVA-SbQ was also studied with UV absorption spectrophotometer. As more SbQ-A was added in the reaction mixture, non-linearity between the amount of bound SbQ group and added SbQ-A salt was observed above 2.09 mol% SbQ group in PVA-SbQ due to viscosity build-up in the medium.

Keywords:stilbazolium compounds;PVA-SbQ;phtodimerization;synthesis of photosensitive polymer

[References]

Patent is pending on part of this paper 특허출원 95-5821
Patent is pending on part of this paper 특허출원 95-5822
Reiser A, "Photoreactive Polymers; The Science and Technology of Resists," A Wiley-Interscience Publication, New York (1989)
DeForest WS, "Photoresist; Materials and Process," Kingsport Press (1975)
Ichimura K, Watanabe S, J. Polym. Sci. C: Polym. Lett., 18, 613 (1982)
Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 20, 1419 (1982)
Ichimura K, J. Polym. Sci. A: Polym. Chem., 20, 1411 (1982)
Ichimura K, J. Polym. Sci. A: Polym. Chem., 22, 2817 (1984)
Ichimura K, U.S. Patent, 4,269,941 (1981)
特許出願公開, 昭 55-24126
特許出願公開, 昭 55-62446
特許出願公開, 平 2-148536

[Referenced By]

[1] Patent is pending on part of this paper 특허출원 95-5821

[2] Patent is pending on part of this paper 특허출원 95-5822

[3] Reiser A, "Photoreactive Polymers; The Science and Technology of Resists," A Wiley-Interscience Publication, New York (1989)

[4] DeForest WS, "Photoresist; Materials and Process," Kingsport Press (1975)

[5] Ichimura K, Watanabe S, J. Polym. Sci. C: Polym. Lett., 18, 613 (1982)

[6] Ichimura K, Watanabe S, J. Polym. Sci. A: Polym. Chem., 20, 1419 (1982)

[7] Ichimura K, J. Polym. Sci. A: Polym. Chem., 20, 1411 (1982)

[8] Ichimura K, J. Polym. Sci. A: Polym. Chem., 22, 2817 (1984)

[9] Ichimura K, U.S. Patent, 4,269,941 (1981)

[10] 特許出願公開, 昭 55-24126

[11] 特許出願公開, 昭 55-62446

[12] 特許出願公開, 平 2-148536