폴리스티렌의 광그라프트 반응 : I. Poly(Styrene-co-BMVB)공중합체의 합성 및 광그라프트 반응

채규호; 윤찬호; 함희석

Polymer(Korea), Vol.20, No.1, 17-24, January, 1996

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폴리스티렌의 광그라프트 반응 : I. Poly(Styrene-co-BMVB)공중합체의 합성 및 광그라프트 반응

Photografting of Polystyrene : I. Preparation and Photografting Reaction of Poly(styrene-co-BMVB)

채규호, 윤찬호, 함희석

초록

폴리스티렌의 소수성의 성질을 친수성으로 개질시키기 위하여 빛에 민감한 옥심 에스테르기를 가진 단량체인 butanedionemonoxime vinylbenzoate (BMVB)와 스티렌과의 공중합체를 합성 한다음 2-hydroxyethyl methacrylate (HEMA) 또는 methacrylic acrid (MAA)를 광그라프트 시켰다 이 공중합체에 대한 광그라프트율은 공중합체 내의 스티렌에 대한 BMVB의 상대적인 비, 빛조사 시간, 그리고 단량체의 농도가 증가할수록 증가하였다. 공중합체의 HEMA에 대한 광그라 프트율은 MAA의 경루 보다 약간 높게 나타났다.

The photosensitive copolymer, poly(styrene-co-BMVB) was prepared by copolymerization of styrene with butanedionemonoxime vinylbenzoate (BMVB) which has photosensitive oxime ester groups. In order to get a hydrophilically modified polystyrene, hydroxyethyl methacrylate (HEMA) or methacrylic acid (MAA) was photografted onto the copolymer. The photografting yield of the copolymer increased with increasing the amount of irradiation time, monomer concentration, and the relative ratio of BMVB over the styrene unit in the copolymer. The photografting yields of the copolymers with HEMA are slightly higher than those of MAA.

Keywords:photosensitive polymer;phtogratfting;modified polystyrene;oxime esters

[References]

Yagci Y, Schnabel W, Prog. Polym. Sci., 15, 551 (1990)
Chapiro A, "Radiation Chemistry of Polymeric Systems," Wiley & Sons Inc., New York (1962)
Sundardi F, Zubir A, Sabarinah Y, Sofiarti W, J. Macromol. Sci.-Chem., A24, 1369 (1987)
Hegazy EA, Ebaid AR, El-Sharabasy SA, Mousa AM, Hassan AY, J. Appl. Polym. Sci., 41, 2941 (1990)
Geacintov N, Stannett V, Abrahamson EW, Hermans J, J. Appl. Polym. Sci., 3, 54 (1960)
Razzak MT, Otsuhata K, Tabata Y, Ohashi F, Takeuchi A, J. Appl. Polym. Sci., 36, 645 (1988)
Shukla SR, GopalaRao GV, Athalye AR, J. Appl. Polym. Sci., 44, 577 (1992)
Kubota H, Yoshino N, Ogiwara Y, J. Appl. Polym. Sci., 39, 1231 (1990)
Yao ZP, Ranby B, J. Appl. Polym. Sci., 40, 1647 (1990)
Kubota H, Eur. Polym. J., 29, 551 (1993)
Chae KH, Park KM, Kim CS, Ahn KD, Polym.(Korea), 12(3), 263 (1988)
Chae KH, Park KM, Choi WC, Kim JM, Polym.(Korea), 12(8), 740 (1988)
Shirai M, Masuda T, Tsunooka M, Tanaka M, Makromol. Chem. Rapid Commun., 5, 689 (1985)
Devi S, Rakshit AK, Guthrie JT, Polym. Int., 25, 23 (1991)
Shukla SR, GopalaRao GV, Athalye AR, J. Appl. Polym. Sci., 42, 2163 (1991)
Kinstle JF, Watson SL, J. Rad. Curing, 2, 7 (1975)

[Referenced By]

[1] Yagci Y, Schnabel W, Prog. Polym. Sci., 15, 551 (1990)

[2] Chapiro A, "Radiation Chemistry of Polymeric Systems," Wiley & Sons Inc., New York (1962)

[3] Sundardi F, Zubir A, Sabarinah Y, Sofiarti W, J. Macromol. Sci.-Chem., A24, 1369 (1987)

[4] Hegazy EA, Ebaid AR, El-Sharabasy SA, Mousa AM, Hassan AY, J. Appl. Polym. Sci., 41, 2941 (1990)

[5] Geacintov N, Stannett V, Abrahamson EW, Hermans J, J. Appl. Polym. Sci., 3, 54 (1960)

[6] Razzak MT, Otsuhata K, Tabata Y, Ohashi F, Takeuchi A, J. Appl. Polym. Sci., 36, 645 (1988)

[7] Shukla SR, GopalaRao GV, Athalye AR, J. Appl. Polym. Sci., 44, 577 (1992)

[8] Kubota H, Yoshino N, Ogiwara Y, J. Appl. Polym. Sci., 39, 1231 (1990)

[9] Yao ZP, Ranby B, J. Appl. Polym. Sci., 40, 1647 (1990)

[10] Kubota H, Eur. Polym. J., 29, 551 (1993)

[11] Chae KH, Park KM, Kim CS, Ahn KD, Polym.(Korea), 12(3), 263 (1988)

[12] Chae KH, Park KM, Choi WC, Kim JM, Polym.(Korea), 12(8), 740 (1988)

[13] Shirai M, Masuda T, Tsunooka M, Tanaka M, Makromol. Chem. Rapid Commun., 5, 689 (1985)

[14] Devi S, Rakshit AK, Guthrie JT, Polym. Int., 25, 23 (1991)

[15] Shukla SR, GopalaRao GV, Athalye AR, J. Appl. Polym. Sci., 42, 2163 (1991)

[16] Kinstle JF, Watson SL, J. Rad. Curing, 2, 7 (1975)