화학공학소재연구정보센터
Clean Technology, Vol.13, No.4, 257-265, December, 2007
포토레지스트 스트리퍼 폐액으로부터 고순도 유기용제 회수
Reclamation of High Purity Organic Solvents from Waste Photoresist Stripper
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초록
반도체 공정에서 배출되는 폐 포토레지스트 스트리퍼(photoresist stripper)의 주성분인 NMP (N-methyl-pyrrolodione)와 BDG (Butyldiglycol)를 회수하여 재활용할 목적으로 나선형 스핀밴드시스템(spinning band system)이 장착되어 있는 진공증류장치를 이용하여 실험실적 규모의 증류실험을 수행하였다 정제된 NMP와 BDG의 순도는 포토레지스트 스트리퍼용 용제 기준 물성치인 순도 99.5% 이상이었고, 수분 1000 ppm 이하, 색도(APHA) 50 이하, 나트륨 성분을 제외한 대부분의 금속성분은 1 ppb 이하로 반도체용 스트리퍼 용액 제조에 재활용할 수 있는 수준임을 확인하였다. NMP와 BDG의 회수율은 PR 스트리퍼 폐액 A타입의 경우 NMP 96%, BDG 53%, B 타입의 경우 NMP 93%, BDG 57% 이었다.
As a basic study for the development of pilot-scale distillation process of waste photoresist strippers from semiconductor industry, lab-scale experiments for the recovery of NMP (N-methyl-pyrrolidione) and BDG (Butyldiglycol) from waste photoresist strippers have been made using a spinning band vacuum distillation column. Purities of NMP and BDG obtained from the present experiments were higher than 99.5%. Furthermore, water content was less than 1000 ppm, color grade(APHA) less than 50, most metal contents except sodium less than 1 ppb. Those results indicate that NMP and BDG reclamed by distillation satisfy the their specifications required for the formulation of new photoresist strippers. Recovery rate of NMP and BDG was 96 and 53%, respectively, for type A, and 93 and 57%, respectively, for type B waste PR stripper solution..
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