Additional capabilities of a thermal curable polydimethylsiloxane based nanoimprinting resist that allows a fast replication (a few seconds) of 70 nm line width structures at low temperatures and low pressures (20 psi) are reported here. Challenging features such as nanopillars and high aspect ratio structures were accurately replicated. Moreover, a composite stamp was fabricated and successfully used to replicate structures from a DVD master. Additionally, it was found that a substrate with surface treatment by fluorinated silane is appropriate to imprint nanogratings with no residual layer. The residual layer can be eliminated on both a hard and a flexible substrate. The stamping of structures without residual layers can be used to create size controlled polymer nanofibers. (C) 2007 American Vacuum Society.